The next generation of Mentor Graphics' optical-proximity correction (OPC) tool has arrived, bringing with it a number of innovations that result in improved simulation accuracy. The next generation ...
SANTA CRUZ, Calif. — Promising to eliminate weeks or months spent rerunning optical proximity correction on IC layouts, startup Aprio Technologies Inc. will introduce its first product this week — a ...
SUNNYVALE, Calif., February 25, 2008 — Gauda, Inc. announced today that it has demonstrated a breakthrough technology that can accelerate OPC (optical proximity correction) and OPV (optimal proximity ...
SANTA CLARA, Calif., March 04, 2025 (GLOBE NEWSWIRE) -- Silvaco Group, Inc. (Nasdaq: SVCO) (“Silvaco” or the “Company”), a provider of TCAD, EDA software and SIP solutions that enable semiconductor ...
(Nanowerk News) Led by Prof. Wei Yayi, a team of researchers from the University of Chinese Academy of Sciences (UCAS) has achieved a significant breakthrough in enhancing the final pattern fidelity ...
Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...
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